Title :
Highly textured ZnO thin films and SnO2/ZnO bilayer films prepared by the pyrosol process
Author :
Song, Jinsoo ; Lee, Changhyun ; Lim, Koengsu ; Yoon, Kyunghoon ; Yu, Kwonjong
Author_Institution :
Korea Inst. of Energy Res., Taejon, South Korea
Abstract :
Indium-doped ZnO(ZnO:In) films have been prepared on heated Corning 7059 glass by pyrosol spray method. Indium improves the conductivity as an n-type dopant and stimulates grain growth. For films grown at 400°C, resistivity of ZnO films decreased from 1.3×10 -2 Ω cm to 3.5×10-3 Ω cm by doping 1 wt% indium. Furthermore, ZnO:In films grown at higher temperture revealed larger grain sizes and a higher texturization compared to undoped films. A highly textured ZnO:In films with resistivity of 2.5×10-3 Ω cm, total transmittance of 80% was made at the substrate temperature of 475°C, and was milky looking. ZnO:In films did not degrade under hydrogen plasma, and was applied as a protection barrier against hydrogen plasma and the light scattering layer in the SnO2/ZnO bilayer films. Bilayer films have a resistivity of 8.8×10-4 Ω cm and total transmittance of 84% at 550 nm, and was proved to have an excellent hydrogen plasma durability
Keywords :
II-VI semiconductors; coating techniques; electrical resistivity; grain growth; grain size; indium; light scattering; light transmission; materials preparation; semiconductor doping; semiconductor growth; semiconductor heterojunctions; semiconductor materials; semiconductor thin films; solar cells; texture; tin compounds; visible spectra; zinc compounds; 1.3E-2 to 3.5E-3 ohmcm; 400 C; 475 C; 550 nm; 8.8E-4 ohmcm; H2 plasma; SnO2-ZnO; SnO2/ZnO bilayer films; Zn0:In; ZnO:In; heated Corning glass substrate; highly textured ZnO thin films; protection barrier; pyrosol process; resistivity; texturization; Conductivity; Doping; Glass; Grain size; Hydrogen; Indium; Plasma temperature; Spraying; Transistors; Zinc oxide;
Conference_Titel :
Photovoltaic Specialists Conference, 1996., Conference Record of the Twenty Fifth IEEE
Conference_Location :
Washington, DC
Print_ISBN :
0-7803-3166-4
DOI :
10.1109/PVSC.1996.564333