Title :
Direct demonstration of sensitization at 980nm optical excitation in erbium-ytterbium silicates
Author :
Vanhoutte, Michiel ; Wang, Bing ; Zhou, Zhiping ; Michel, Jürgen ; Kimerling, Lionel C.
Author_Institution :
Microphotonics Center, Massachusetts Inst. of Technol., Cambridge, MA, USA
Abstract :
Sensitization of erbium by ytterbium in ErxYb2-xSiO5 thin films at 980nm optical excitation is demonstrated by means of comparison of the 1.54μm photoluminescence intensities excited with 488nm and 980nm light. Additionally, it is shown that detrimental Er-Er interactions such as concentration quenching increase non-radiative decay rates at high erbium concentrations. Dilution of erbium by ytterbium reduces these interactions, leading to an increase of internal quantum efficiency.
Keywords :
erbium compounds; excitons; photoluminescence; thin films; ytterbium compounds; ErxYb2-xSiO5; concentration quenching; dilution; erbium-ytterbium silicates; internal quantum efficiency; nonradiative decay; optical excitation; photoluminescence; sensitization; thin films; wavelength 1.54 mum; wavelength 488 nm; wavelength 980 nm; Equations; Erbium; Films; Ions; Optical pumping; Photoluminescence; Ytterbium;
Conference_Titel :
Group IV Photonics (GFP), 2010 7th IEEE International Conference on
Conference_Location :
Beijing
Print_ISBN :
978-1-4244-6344-2
DOI :
10.1109/GROUP4.2010.5643345
