Title :
Nonlinearity measurement of thin metal films
Author :
Vávra, Robert ; Mach, Pavel
Author_Institution :
Dept. of Electrotechnol., Czech Tech. Univ., Prague, Czech Republic
Abstract :
Investigation of nonlinearity of thin metal films, which have been manufactured by sputtering under various conditions in Ar, is the goal of this paper. The measurement of nonlinearity by CLTI equipment (Radiometer, Copenhagen) is described in detail and the measurement by the use of a new measuring method, which is based on intermodulation distortion, is presented too. Measured values of nonlinearity of Ni, Al and Al-Si thin films are presented at the end of this paper
Keywords :
aluminium; aluminium alloys; intermodulation distortion; metallic thin films; metallisation; nickel; silicon alloys; spatial variables measurement; sputter deposition; Al; Al thin films; Al-Si thin films; AlSi; Ar; Ar sputtering atmosphere; Ni; Ni thin films; intermodulation distortion; measuring method; nonlinearity; nonlinearity measurement; sputtering; thin metal films; Band pass filters; Circuits; Conducting materials; Distortion measurement; Electrical resistance measurement; Impedance measurement; Power harmonic filters; Q measurement; Sputtering; Voltmeters;
Conference_Titel :
Electronics Technology: Concurrent Engineering in Electronic Packaging, 2001. 24th International Spring Seminar on
Conference_Location :
Calimanesti-Caciulata
Print_ISBN :
0-7803-7111-9
DOI :
10.1109/ISSE.2001.931056
