Title :
Propagation loss of amorphous silicon optical waveguides at the 0.8 µm-wavelength range
Author :
Asukai, Takahiro ; Inamoto, Makoto ; Maruyama, Takeo ; Iiyama, Koichi ; Ohdaira, Keisuke ; Matsumura, Hideki
Author_Institution :
Natural Sci. & Technol., Kanazawa Univ., Ishikawa, Japan
Abstract :
We fabricated optical waveguides using amorphous silicon deposited by catalytic chemical vapor deposition method. The waveguides were fabricated by photolithography and wet chemical etching. The propagation loss of 15 dB/cm at 830 nm was measured.
Keywords :
amorphous semiconductors; chemical vapour deposition; elemental semiconductors; etching; optical fabrication; optical waveguides; photolithography; silicon; Si; amorphous silicon optical waveguides; catalytic chemical vapor deposition; photolithography; propagation loss; waveguides fabrication; wavelength 0.8 mum; wet chemical etching; Loss measurement; Optical device fabrication; Optical fibers; Propagation losses; Silicon; Amorphous silicon; Cat-CVD; optical waveguides; optoelectronics integrated circuit; silicon photonics;
Conference_Titel :
Group IV Photonics (GFP), 2010 7th IEEE International Conference on
Conference_Location :
Beijing
Print_ISBN :
978-1-4244-6344-2
DOI :
10.1109/GROUP4.2010.5643356
