DocumentCode :
3203740
Title :
Effect of doping-induced defect concentration on the characteristics of Si-quantum-dot solar cells
Author :
Shin, Dong Hee ; Hong, Seung Hui ; Kim, Chang Oh ; Choi, Suk-Ho ; Kim, Kyung Joong
Author_Institution :
Dept. of Appl. Phys., Kyung Hee Univ., Yongin, South Korea
fYear :
2010
fDate :
1-3 Sept. 2010
Firstpage :
144
Lastpage :
146
Abstract :
In summary, p-type (or n-type) Si QDs/n-type (or p-type) crystalline-Si solar cells were successfully fabricated by ion beam sputtering and annealing, and their photovoltaic and luminescence properties were studied as functions of doping element and concentration. The active doping of B into the Si quantum dots was successfully proved to be due to the preferred diffusion of B into Si QDs by SIMS depth profiling analysis of B-doped Si02/B-doped Si multilayer film before and after annealing. The B-doped Si-QD solar cells showed close correlation of the photovoltaic properties with the NC/defect PL behaviors. Possible physical mechanisms will be discussed based on the doping-dependent experimental results for various doping elements.
Keywords :
annealing; boron; elemental semiconductors; ion beam assisted deposition; photoluminescence; photovoltaic effects; secondary ion mass spectra; semiconductor doping; semiconductor growth; semiconductor quantum dots; silicon; silicon compounds; silicon-on-insulator; solar cells; sputter deposition; superlattices; B active doping; B-doped Si-quantum dot solar cells; B-doped silica/B-doped Si multilayer film; NC/defect PL behaviors; SIMS depth profiling analysis; SiO2-Si:B; annealing; doping concentration; doping element; doping-induced defect concentration; ion beam sputtering; luminescence properties; n-type crystalline-Si solar cells; p-type Si quantum dots; photovoltaic properties; physical mechanisms; preferred diffusion; Annealing; Doping; Films; Photovoltaic cells; Photovoltaic systems; Silicon;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Group IV Photonics (GFP), 2010 7th IEEE International Conference on
Conference_Location :
Beijing
Print_ISBN :
978-1-4244-6344-2
Type :
conf
DOI :
10.1109/GROUP4.2010.5643398
Filename :
5643398
Link To Document :
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