DocumentCode
3203942
Title
DC Bias Effect on Nanocrystalline Silicon Solar Cell Deposited under a High Power High Pressure Regime
Author
Ishikawa, Yasuaki ; Cao, Xinmin ; Du, Wenhui ; Das, Chandan ; Deng, Xunming
Author_Institution
Dept. of Phys. & Astron., Toledo Univ., OH
Volume
2
fYear
2006
fDate
38838
Firstpage
1493
Lastpage
1496
Abstract
We present the effect of external DC-voltage application to substrate during preparation of nanocrystalline silicon solar cell. The deposition rate, grain size, orientation property is independent of the bias conditions, whereas the crystal volume fraction shows drastic change by applying DC-voltage. This modification results in cell performance variations. A positive bias of 20 V exhibits the highest efficiency of 7.7%, while further positive bias and any negative bias produce lower efficiencies than the one made at zero bias (~6.0%). Even if we adjust the hydrogen dilution ratio so as to optimize cell performances at several bias condition, positive 20 V still shows the maximum efficiency, suggesting that the appropriate positive bias value (~ positive 20 V) is effective in improving nc-Si:H solar cell performances
Keywords
crystal orientation; elemental semiconductors; grain size; high-pressure effects; hydrogen; nanostructured materials; nanotechnology; semiconductor thin films; silicon; solar cells; thin film devices; 20 V; 7.7 percent; DC bias effect; DC-voltage; Si:H; crystal volume fraction; deposition rate; grain size; high power high pressure regime; hydrogen dilution ratio; nanocrystalline silicon solar cell preparation; optimize cell performances; orientation property; semiconductor thin films; Crystallization; Electrodes; Grain size; Hydrogen; Photovoltaic cells; Plasma temperature; Silicon; Steel; Substrates; Surface discharges;
fLanguage
English
Publisher
ieee
Conference_Titel
Photovoltaic Energy Conversion, Conference Record of the 2006 IEEE 4th World Conference on
Conference_Location
Waikoloa, HI
Print_ISBN
1-4244-0017-1
Electronic_ISBN
1-4244-0017-1
Type
conf
DOI
10.1109/WCPEC.2006.279752
Filename
4059930
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