DocumentCode :
3204036
Title :
Free charge carrier induced refractive index modulation of crystalline silicon
Author :
Singh, Aashish
Author_Institution :
Dept. of Electr. & Comput. Syst. Eng., Monash Univ., Clayton, VIC, Australia
fYear :
2010
fDate :
1-3 Sept. 2010
Firstpage :
102
Lastpage :
104
Abstract :
New relationships for the free carrier induced refractive index modulation of crystalline silicon at 1.3 and 1.55 μm are derived. Free electrons are more effective in perturbing the refractive index compared to free holes.
Keywords :
elemental semiconductors; refractive index; silicon; Si; crystalline silicon; free charge carrier induced refractive index modulation; free electrons; Absorption; Charge carrier processes; Doping; Refractive index; Scattering; Semiconductor process modeling; Silicon;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Group IV Photonics (GFP), 2010 7th IEEE International Conference on
Conference_Location :
Beijing
Print_ISBN :
978-1-4244-6344-2
Type :
conf
DOI :
10.1109/GROUP4.2010.5643412
Filename :
5643412
Link To Document :
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