DocumentCode
320404
Title
Si texturing with sub-wavelength structures [solar cell production]
Author
Zaidi, Saleem H. ; Brueck, S.R.J.
Author_Institution
Center for High Technol. Mater., New Mexico Univ., Albuquerque, NM, USA
fYear
1997
fDate
29 Sep-3 Oct 1997
Firstpage
171
Lastpage
174
Abstract
Si solar cell surface reflection has been investigated with textured structures smaller than the optical wavelengths. This physical optics approach relies upon absorption through a waveguide mechanism, and has been realized for both uniform and random structures. Laser interferometric lithography techniques have been combined with conventional wet and reactive ion etching of Si to form a wide range of nanoscale 1-D and 2-D structures in both single and polycrystalline Si substrates. Maskless reactive ion etching of Si has also been employed to form highly absorptive nanoscale structures. For identically etched structures, uniform structures showed an order of magnitude smaller reflectance than random structures
Keywords
elemental semiconductors; light interferometry; light reflection; lithography; semiconductor device testing; silicon; solar cells; sputter etching; surface texture; Si; Si solar cells; laser interferometric lithography; nanoscale structures; optical wavelength; reactive ion etching; reflectance; solar cell texturing; sub-wavelength structures; surface reflection; wet etching; Etching; Optical reflection; Optical surface waves; Optical waveguides; Particle beam optics; Photovoltaic cells; Physical optics; Production; Surface texture; Surface waves;
fLanguage
English
Publisher
ieee
Conference_Titel
Photovoltaic Specialists Conference, 1997., Conference Record of the Twenty-Sixth IEEE
Conference_Location
Anaheim, CA
ISSN
0160-8371
Print_ISBN
0-7803-3767-0
Type
conf
DOI
10.1109/PVSC.1997.654056
Filename
654056
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