• DocumentCode
    320404
  • Title

    Si texturing with sub-wavelength structures [solar cell production]

  • Author

    Zaidi, Saleem H. ; Brueck, S.R.J.

  • Author_Institution
    Center for High Technol. Mater., New Mexico Univ., Albuquerque, NM, USA
  • fYear
    1997
  • fDate
    29 Sep-3 Oct 1997
  • Firstpage
    171
  • Lastpage
    174
  • Abstract
    Si solar cell surface reflection has been investigated with textured structures smaller than the optical wavelengths. This physical optics approach relies upon absorption through a waveguide mechanism, and has been realized for both uniform and random structures. Laser interferometric lithography techniques have been combined with conventional wet and reactive ion etching of Si to form a wide range of nanoscale 1-D and 2-D structures in both single and polycrystalline Si substrates. Maskless reactive ion etching of Si has also been employed to form highly absorptive nanoscale structures. For identically etched structures, uniform structures showed an order of magnitude smaller reflectance than random structures
  • Keywords
    elemental semiconductors; light interferometry; light reflection; lithography; semiconductor device testing; silicon; solar cells; sputter etching; surface texture; Si; Si solar cells; laser interferometric lithography; nanoscale structures; optical wavelength; reactive ion etching; reflectance; solar cell texturing; sub-wavelength structures; surface reflection; wet etching; Etching; Optical reflection; Optical surface waves; Optical waveguides; Particle beam optics; Photovoltaic cells; Physical optics; Production; Surface texture; Surface waves;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Photovoltaic Specialists Conference, 1997., Conference Record of the Twenty-Sixth IEEE
  • Conference_Location
    Anaheim, CA
  • ISSN
    0160-8371
  • Print_ISBN
    0-7803-3767-0
  • Type

    conf

  • DOI
    10.1109/PVSC.1997.654056
  • Filename
    654056