• DocumentCode
    3204293
  • Title

    Massive Improvement Through Rapid Thermal Annealing and Hydrogen Passivation of Poly-Si Thin-Film Solar Cells on Glass Based on Aluminum Induced Crystallization

  • Author

    Terry, Mason L. ; Inns, Daniel ; Aberle, Armin G.

  • Author_Institution
    Centre of Excellence for Adv. Silicon Photovoltaics & Photonics, New South Wales Univ., Sydney, NSW
  • Volume
    2
  • fYear
    2006
  • fDate
    38838
  • Firstpage
    1560
  • Lastpage
    1563
  • Abstract
    In this paper, the changes in Voc, Jsc and IQE of ALICIA (ALuminum Induced Crystallization, Ion Assisted deposition) pc-Si thin-film solar cells on glass due to rapid thermal anneal (RTA) treatment and remote microwave hydrogen plasma passivation are examined. Voc improvements from 130 mV to 430 mV, Jsc improvements from 1.2 mA/cm2 to 11 mA/cm2 , and peak IQE improvements from 16% to >70% are achieved. The effect of hydrogenation on defects that limit the cells´ current and voltage is dramatic, resulting in a gain in Jsc of a factor of 3.4 from hydrogenation alone. A 1-sec RTA at 1000 degC followed by hydrogenation increases the Jsc by a massive factor of 5.5. The evaluation of the passivation of defects has led to a better understanding of the limiting factors to cell performance. This improved understanding paves the way towards ALICIA solar cells with open-circuit voltages above 500 mV
  • Keywords
    aluminium; crystallisation; elemental semiconductors; ion beam assisted deposition; passivation; rapid thermal annealing; silicon; solar cells; thin film devices; 1 s; 1000 C; 130 to 430 mV; Si; aluminum induced crystallization; glass; hydrogenation; ion assisted deposition; microwave hydrogen plasma passivation; open-circuit voltages; polysilicon thin-film solar cells; rapid thermal annealing; Aluminum; Crystallization; Glass; Hydrogen; Passivation; Photovoltaic cells; Rapid thermal annealing; Sputtering; Transistors; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Photovoltaic Energy Conversion, Conference Record of the 2006 IEEE 4th World Conference on
  • Conference_Location
    Waikoloa, HI
  • Print_ISBN
    1-4244-0017-1
  • Electronic_ISBN
    1-4244-0017-1
  • Type

    conf

  • DOI
    10.1109/WCPEC.2006.279782
  • Filename
    4059948