• DocumentCode
    320430
  • Title

    Front surface engineering of high efficiency Si solar cells and Ge TPV cells

  • Author

    Faur, M. ; Faur, M. ; Bailey, S.G. ; Flood, D.J. ; Brinker, D.J. ; Wheeler, D.R. ; Alterovitz, S.A. ; Scheiman, David ; Mateescu, Georgiana ; Faulk, J. ; Goradia, C. ; Goradia, M.

  • Author_Institution
    SPECMAT Inc., North Olmsted, OH, USA
  • fYear
    1997
  • fDate
    29 Sep-3 Oct 1997
  • Firstpage
    847
  • Lastpage
    851
  • Abstract
    We demonstrate the effectiveness of using wet chemical techniques for Si and Ge planar surfaces to form nanoporous layers, and grow stable passivating oxide layers on planar and porous surfaces, after the front grid metallization step. Our results show that this passivated chemical oxide layer: (i) can serve as an effective window/first layer AR coating, (ii) is chemically, thermally and UV stable, (iii) can simplify the structure of Si, Ge and III-V based space solar cells, thereby reducing cost, and (iv) has the potential of improving the BOL and especially the EOL efficiency of Si and III-V based space solar cells
  • Keywords
    III-V semiconductors; coating techniques; elemental semiconductors; germanium; passivation; photovoltaic cells; porous materials; semiconductor growth; silicon; solar cells; space vehicle power plants; Ge; Ge TPV cells; Ge planar surfaces; III-V based space solar cells; Si; Si planar surfaces; UV stable layer; chemically stable layer; cost reduction; efficiency improvement; first layer AR coating; front grid metallization step; front surface engineering; high efficiency Si solar cells; nanoporous layers; passivated chemical oxide layer; passivating oxide layers; porous surfaces; thermally stable layer; thermophotovoltaic cells; wet chemical techniques; Chemicals; Coatings; Etching; Floods; III-V semiconductor materials; Metallization; NASA; Passivation; Photovoltaic cells; Surface engineering;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Photovoltaic Specialists Conference, 1997., Conference Record of the Twenty-Sixth IEEE
  • Conference_Location
    Anaheim, CA
  • ISSN
    0160-8371
  • Print_ISBN
    0-7803-3767-0
  • Type

    conf

  • DOI
    10.1109/PVSC.1997.654220
  • Filename
    654220