The Spatial Distribution of Neutral Radicals in SiH4 RF Glow Discharges Measured by a Mass Spectrometer with a Movable Gas Sampling System

Author

Lin, Kuixun ; Lin, Xuanying ; Wang, Zhaokui ; Qiu, Guiming ; Zhu, Zusong

Author_Institution

Dept. of Phys., Shantou Univ.

Volume

2

fYear

2006

fDate

38838

Firstpage

1696

Lastpage

1699

Abstract

A movable mass spectroscopy gas sampling apparatus has been proposed, established and equipped in a residual gas analyzer (SRS RGA-100). This mass spectroscopy analysis system has been used to measure the spatial density distributions of SiH_n (n=0-3) radicals in silane radio frequency glow discharge successfully. The experimental results demonstrate that the densities of various neutral radicals SiH_n (n=0-3) in silane plasma have each peak value near the middle position of electrodes, and the densities of SiH₂ and SiH₃ are higher than those of Si and SiH. This reveals that SiH₂ and SiH₃ may be the primary precursors in forming the a-Si:H film

Keywords

electrodes; elemental semiconductors; glow discharges; high-frequency discharges; hydrogen; plasma density; plasma materials processing; plasma-wall interactions; semiconductor thin films; silicon; SRS RGA-100; Si:H; mass spectrometer; movable mass spectroscopy gas sampling; neutral radicals; radio frequency glow discharges; residual gas analyzer; silane plasma; spatial density distributions; Density measurement; Electrodes; Glass; Glow discharges; Mass spectroscopy; Plasma density; Plasma measurements; Radio frequency; Sampling methods; Semiconductor films;

fLanguage

English

Publisher

ieee

Conference_Titel

Photovoltaic Energy Conversion, Conference Record of the 2006 IEEE 4th World Conference on

Conference_Location

Waikoloa, HI

Print_ISBN

1-4244-0017-1

Electronic_ISBN

1-4244-0017-1

Type

conf

DOI

10.1109/WCPEC.2006.279817

Filename

4059983