Title :
Using yield models to accelerate learning curve progress
Author :
Dance, Daren ; Jarvis, Richard
Author_Institution :
SEMATECH Inc., Austin, TX, USA
Abstract :
The authors describe the application of yield models at SEMATECH to define the relative contribution of unit process steps and equipment to particle-limited yield. After validation, these detailed models can simulate the yield effects of process and equipment improvement plans. Yield models, used with short-loop defect monitors, allow immediate feedback of experiment effects to yield improvement efforts. Rapid feedback accelerates learning by bypassing normal processing cycle time delays. SEMATECH experience is used to outline methods for developing a detailed yield model, collecting manufacturing parameters, and validating results. Detailed yield models use the relationship between the learning curve and the process improvement cycle to accelerate the rate of performance-price improvement
Keywords :
integrated circuit manufacture; integrated circuit technology; semiconductor technology; SEMATECH; accelerate learning curve progress; bypassing normal processing cycle time delays; equipment improvement; immediate feedback of experiment effects; learning curve; particle-limited yield; performance-price improvement; process improvement cycle; rapid feedback accelerated learning curve; short-loop defect monitors; yield models; Acceleration; Continuous improvement; Costs; Electronics industry; Feedback; Production; Productivity; Semiconductor device manufacture; Testing; Virtual manufacturing;
Conference_Titel :
Semiconductor Manufacturing Science Symposium, 1990. ISMSS 1990., IEEE/SEMI International
Conference_Location :
Burlingame, CA
DOI :
10.1109/ISMSS.1990.66108