• DocumentCode
    3210234
  • Title

    Improving the electron emission properties of ion-beam-synthesized Ag-Si02 nanocomposites by pulsed laser annealing

  • Author

    Tsang, W.M. ; Adikaari, A. A D T ; Stolojan, V. ; Sealy, B. ; Wong, S.P. ; Silva, S.R.P.

  • Author_Institution
    Massachusetts Inst. of Technol., Cambridge
  • fYear
    2007
  • fDate
    8-12 July 2007
  • Firstpage
    102
  • Lastpage
    103
  • Abstract
    In this work, pulsed laser annealing (PLA) was preformed on ion-beam-synthesized Ag-SiO2 nanocomposites to improve the FE properties of these samples by modifying the size and distribution of the Ag nanoclusters. The PLA was preformed using a 248 nm KrF excimer laser. Multiple pulses, with durations of 25 ns, at an energy density of 250 mJ/cm were accumulated onto the sample. The FE properties of the samples were studied in a high vacuum chamber, with a base pressure better than 5x10-4 Pa. The current-electric field (I-F) characteristics were measured using a "sphere-to-plane" electrode configuration, with a 5 mm diameter stainless-steel ball anode. The applied electric field was obtained by dividing the applied voltage by the gap distance and the threshold field (Fth) and is defined as the field strength when an emission current of 1 nA is achieved. The microstructure and the surface morphology of these samples are determined by the cross-section transmission electron microscopy (XTEM) and atomic force microscopy (AFM) measurements, respectively.
  • Keywords
    atomic force microscopy; electron field emission; excimer lasers; ion beam applications; krypton compounds; laser beam annealing; nanocomposites; particle size; silver compounds; surface morphology; transmission electron microscopy; AFM; Ag-SiO2; KrF; XTEM; atomic force microscopy; cross-section transmission electron microscopy; current 1 nA; current-electric field characteristics measurement; electron field emission properties; emission current; excimer laser; high vacuum chamber; ion-beam-synthesized nanocomposites; microstructure; nanocluster size; pulsed laser annealing; size 5 mm; sphere-to-plane electrode configuration; stainless-steel ball anode; surface morphology; threshold field; time 25 ns; wavelength 248 nm; Annealing; Atomic force microscopy; Atomic measurements; Electron emission; Force measurement; Iron; Nanocomposites; Optical pulses; Programmable logic arrays; Transmission electron microscopy;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Vacuum Nanoelectronics Conference, 2007. IVNC. IEEE 20th International
  • Conference_Location
    Chicago, IL
  • Print_ISBN
    978-1-4244-1133-7
  • Electronic_ISBN
    978-1-4244-1134-4
  • Type

    conf

  • DOI
    10.1109/IVNC.2007.4480951
  • Filename
    4480951