• DocumentCode
    3210651
  • Title

    Modeling of NBTI degradation and its impact on electric field dependence of the lifetime

  • Author

    Aono, H. ; Murakami, E. ; Okuyama, K. ; Nishida, A. ; Minami, M. ; Ooji, Y. ; Kubota, K.

  • Author_Institution
    Renesas Technol. Corp., Ibaraki, Japan
  • fYear
    2004
  • fDate
    25-29 April 2004
  • Firstpage
    23
  • Lastpage
    27
  • Abstract
    Negative Bias Temperature Instability of p-MOSFETs is investigated under various stress gate voltages and temperatures. It is shown that degradation tends to saturate and the dependence of lifetime on electric field (Eox) is expressed as a power-law of Eox. We propose new empirical and kinetic models. The Eox dependence of the lifetime described by the power-law is derived from our empirical model describing the saturation of degradation. Moreover, our kinetic model explains the saturation behavior.
  • Keywords
    MOSFET; electric breakdown; semiconductor device breakdown; semiconductor device models; semiconductor device reliability; NBTI degradation modeling; Negative Bias Temperature Instability; electric field dependence; empirical models; kinetic models; lifetime; p-MOSFETs; stress gate voltages; Degradation; Kinetic theory; Life estimation; MOSFET circuits; Niobium compounds; Semiconductor device modeling; Stress; Temperature; Titanium compounds; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Reliability Physics Symposium Proceedings, 2004. 42nd Annual. 2004 IEEE International
  • Print_ISBN
    0-7803-8315-X
  • Type

    conf

  • DOI
    10.1109/RELPHY.2004.1315296
  • Filename
    1315296