DocumentCode :
3210651
Title :
Modeling of NBTI degradation and its impact on electric field dependence of the lifetime
Author :
Aono, H. ; Murakami, E. ; Okuyama, K. ; Nishida, A. ; Minami, M. ; Ooji, Y. ; Kubota, K.
Author_Institution :
Renesas Technol. Corp., Ibaraki, Japan
fYear :
2004
fDate :
25-29 April 2004
Firstpage :
23
Lastpage :
27
Abstract :
Negative Bias Temperature Instability of p-MOSFETs is investigated under various stress gate voltages and temperatures. It is shown that degradation tends to saturate and the dependence of lifetime on electric field (Eox) is expressed as a power-law of Eox. We propose new empirical and kinetic models. The Eox dependence of the lifetime described by the power-law is derived from our empirical model describing the saturation of degradation. Moreover, our kinetic model explains the saturation behavior.
Keywords :
MOSFET; electric breakdown; semiconductor device breakdown; semiconductor device models; semiconductor device reliability; NBTI degradation modeling; Negative Bias Temperature Instability; electric field dependence; empirical models; kinetic models; lifetime; p-MOSFETs; stress gate voltages; Degradation; Kinetic theory; Life estimation; MOSFET circuits; Niobium compounds; Semiconductor device modeling; Stress; Temperature; Titanium compounds; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Reliability Physics Symposium Proceedings, 2004. 42nd Annual. 2004 IEEE International
Print_ISBN :
0-7803-8315-X
Type :
conf
DOI :
10.1109/RELPHY.2004.1315296
Filename :
1315296
Link To Document :
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