DocumentCode :
3214572
Title :
Deposition and characterization of ZnO:Al thin films by ultrasonic spray pyrolysis
Author :
Babu, B.J. ; Maldonado, A. ; Velumani, S.
Author_Institution :
Dept. de Ing. Electr.-SEES, CINVESTAV-IPN, Mexico City, Mexico
fYear :
2009
fDate :
10-13 Jan. 2009
Firstpage :
1
Lastpage :
5
Abstract :
Al-doped ZnO (AZO) thin films were prepared using simple, flexible and cost-effective ultrasonic spray pyrolysis (USP) technique at different substrate temperatures. Zinc acetate dehydrate (Zn (CH3COO)2.2H2O) and Aluminum acetylacetonate (C15H21AlO6) were used as precursors and the solvent was a mixture of de-ionized water, methanol and acetic acid. Substrate temperatures are varied for 3 at% Al-doped film between 450°C to 500°C. The film´s structural, optical and electrical properties were investigated by X-ray diffraction (XRD), field emission scanning electron microscopy (FESEM), UV-VIS transmittance spectroscopy, photoluminescence (PL) and Hall measurements. The obtained films were polycrystalline with a hexagonal wurtzite structure and preferentially oriented in the (002) crystallographic direction. Grain sizes varied from 21.3 to 25.3 nm based on substrate temperature. FESEM images revealed that the film morphology is strongly affected by the substrate temperature. Transmission measurements showed that for visible wavelength (400-700 nm), the AZO films have an average transmission of 75%. Optical band gap of AZO films is varied from 3.26 to 3.29 eV with the increase in substrate temperature. PL spectra showed ZnO:Al films with a low density of native defects. Resistivity of the films varied from 0.7 Ohm-cm to 2 × 10-2 Ohm-cm. Minimum electrical resistivity was obtained for film deposited at 475°C with film thickness of 602 nm.
Keywords :
Hall effect; II-VI semiconductors; X-ray diffraction; aluminium; electrical resistivity; energy gap; field emission electron microscopy; grain size; photoluminescence; pyrolysis; scanning electron microscopy; semiconductor growth; semiconductor thin films; spray coating techniques; ultraviolet spectra; visible spectra; wide band gap semiconductors; zinc compounds; FESEM image; Hall measurement; UV-VIS transmittance spectroscopy; X-ray diffraction; ZnO:Al; acetic acid; deionized water; electrical property; electrical resistivity; field emission scanning electron microscopy; film morphology; hexagonal wurtzite structure; methanol acid; optical band gap; optical property; photoluminescence; polycrystalline; size 21.3 nm to 25.3 nm; solvent; structural property; substrate temperature; temperature 450 C to 500 C; thin film deposition; ultrasonic spray pyrolysis; Aluminum; Optical films; Optical microscopy; Solvents; Spraying; Sputtering; Substrates; Temperature; Transistors; Zinc oxide; AZO; EDX; FESEM; PL; USP; UV-VIS; XRD;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electrical Engineering, Computing Science and Automatic Control,CCE,2009 6th International Conference on
Conference_Location :
Toluca
Print_ISBN :
978-1-4244-4688-9
Electronic_ISBN :
978-1-4244-4689-6
Type :
conf
DOI :
10.1109/ICEEE.2009.5393563
Filename :
5393563
Link To Document :
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