DocumentCode :
3214945
Title :
Optimization and fabrication of the photonic crystals for large absolute band gaps
Author :
Jia, Wei ; Deng, Jun ; Danner, Aaron ; Li, Xiangyin
Author_Institution :
Sch. of Sci., Nanjing Univ. of Sci. & Technol., Nanjing, China
Volume :
4
fYear :
2011
fDate :
29-31 July 2011
Abstract :
In the paper, Optimization algorithm is used to design two-dimensional photonic crystals for large absolute band gaps. By optimizing the location and radius of rods in the unit cell, we present tree designs considering different shape rods. The genetic algorithm finally yielded a photonic crystal with an absolute common band gap of 0.0796(2πc/a) at the mid-frequency of 0.3712(2πc/a). The result have been fabricated using e-beam lithography (EBL) and inductively coupled plasma (ICP). We can find a large absolute band gap can be obtained.
Keywords :
electron beam lithography; genetic algorithms; optical design techniques; optical fabrication; photonic band gap; photonic crystals; absolute band gaps; e-beam lithography; genetic algorithm; inductively coupled plasma; optimization; rods shape; two-dimensional photonic crystals; Photonics; fabrication; photonic band-gap under light line; two-dimensional photonic crystals;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electronics and Optoelectronics (ICEOE), 2011 International Conference on
Conference_Location :
Dalian
Print_ISBN :
978-1-61284-275-2
Type :
conf
DOI :
10.1109/ICEOE.2011.6013449
Filename :
6013449
Link To Document :
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