Tuning the exchange bias training effect in top and bottom pinning FeNi/FeMn bilayers

In this presented work, both top and bottom pinning FeNi/FeMn bialyers were prepared by sputtering with an external field applied in the film plane during deposition. The training processes were performed with a vector vibrating sample magnetometer (VVSM) through which M_x and M_y can be measured simultaneously. Before the tuning process, ten loops were measured at an angle of six degrees with respect to the initial PD, to eliminate the training effect to a very low extent. Then an in-plane tuning field of 600 Oe was applied perpendicular to the initial PD for five minutes. During the whole process, the rotation of the PD is identified with M_y = 0 and M_x = Maximum immediately after each M-H loop measurement and each tuning process [3].