• DocumentCode
    3215723
  • Title

    A method of tip-sample distance control based on electrostatic force in maskless microplasma scanning etching

  • Author

    Cheng, Leili ; Wen, Li ; Yuan, Zhen ; Niu, Dun ; He, Liwen ; Chu, Jiaru

  • Author_Institution
    Dept. of Precision Machinery & Precision Instrum., Univ. of Sci. & Technol. of China, Hefei, China
  • Volume
    4
  • fYear
    2011
  • fDate
    29-31 July 2011
  • Abstract
    In cantilever-based microplasma etching system proposed by our group, the controlling of tip-sample distance is important for maskless canning etching. This paper presents a tip-sample controlling method based on electrostatic force. Theoretical model to calculate the electrostatic force between the conductive probe and the sample is established. The relationship of the electrostatic force and the tip-sample distance under different bias voltages is investigated by experiments based on AFM. Both the theory and experiments prove that this electrostatic force is feasible for maskless scanning plasma etching with the etching distance of 1-2μm.
  • Keywords
    electrostatics; microfabrication; position control; scanning probe microscopy; sputter etching; bias voltage; cantilever-based microplasma etching system; conductive probe; distance 1 mum to 2 mum; electrostatic force; etching distance; maskless microplasma scanning etching; tip-sample distance control; Nickel; Silicon; distance controlling; electrostatic force; microplasma; scanning etching;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electronics and Optoelectronics (ICEOE), 2011 International Conference on
  • Conference_Location
    Dalian
  • Print_ISBN
    978-1-61284-275-2
  • Type

    conf

  • DOI
    10.1109/ICEOE.2011.6013487
  • Filename
    6013487