DocumentCode
3215723
Title
A method of tip-sample distance control based on electrostatic force in maskless microplasma scanning etching
Author
Cheng, Leili ; Wen, Li ; Yuan, Zhen ; Niu, Dun ; He, Liwen ; Chu, Jiaru
Author_Institution
Dept. of Precision Machinery & Precision Instrum., Univ. of Sci. & Technol. of China, Hefei, China
Volume
4
fYear
2011
fDate
29-31 July 2011
Abstract
In cantilever-based microplasma etching system proposed by our group, the controlling of tip-sample distance is important for maskless canning etching. This paper presents a tip-sample controlling method based on electrostatic force. Theoretical model to calculate the electrostatic force between the conductive probe and the sample is established. The relationship of the electrostatic force and the tip-sample distance under different bias voltages is investigated by experiments based on AFM. Both the theory and experiments prove that this electrostatic force is feasible for maskless scanning plasma etching with the etching distance of 1-2μm.
Keywords
electrostatics; microfabrication; position control; scanning probe microscopy; sputter etching; bias voltage; cantilever-based microplasma etching system; conductive probe; distance 1 mum to 2 mum; electrostatic force; etching distance; maskless microplasma scanning etching; tip-sample distance control; Nickel; Silicon; distance controlling; electrostatic force; microplasma; scanning etching;
fLanguage
English
Publisher
ieee
Conference_Titel
Electronics and Optoelectronics (ICEOE), 2011 International Conference on
Conference_Location
Dalian
Print_ISBN
978-1-61284-275-2
Type
conf
DOI
10.1109/ICEOE.2011.6013487
Filename
6013487
Link To Document