DocumentCode
3215743
Title
Chip Improvements for Future IGBT Modules
Author
Donlon, John F. ; Motto, Eric R. ; Takahashi, Tetsuo ; Fujii, Hidenori ; Satoh, Katsumi
Author_Institution
Powerex, Inc., Youngwood, PA
fYear
2008
fDate
5-9 Oct. 2008
Firstpage
1
Lastpage
7
Abstract
Since the introduction of the IGBT module, improvements in power loss have been achieved by applying new technologies. With the process improvements of the past few years in trench gate technology and light-punch-through vertical structures, it had been thought that the performance of the latest IGBT and pin diode silicon power devices had been brought as close to their theoretical limit as possible. In this paper, fine pattern processing technology is applied along with optimization of the low impurity profile of the buffer layer using thin wafer technology to further reduce the power loss.
Keywords
insulated gate bipolar transistors; integrated circuit design; p-i-n diodes; IGBT modules; buffer layer; light-punch-through vertical structures; pin diode silicon power devices; power loss; power loss reduction; thin wafer technology; trench gate technology; Bipolar transistors; Buffer layers; Diodes; Energy loss; Insulated gate bipolar transistors; Noise reduction; Semiconductor device noise; Silicon; Surface resistance; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Industry Applications Society Annual Meeting, 2008. IAS '08. IEEE
Conference_Location
Edmonton, Alta.
ISSN
0197-2618
Print_ISBN
978-1-4244-2278-4
Electronic_ISBN
0197-2618
Type
conf
DOI
10.1109/08IAS.2008.368
Filename
4659156
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