DocumentCode :
3216050
Title :
Rigorous dynamic model of a distillation process and its application
Author :
Zhu, Xuemei
Author_Institution :
Coll. of Electr. & Autom. Eng., Nanjing Normal Univ., Nanjing, China
fYear :
2010
fDate :
9-11 June 2010
Firstpage :
1076
Lastpage :
1080
Abstract :
In this paper, the rigorous dynamic model of a distillation process is proposed to realize its dynamic optimization and advanced control. In the rigorous model, the component compositions of vapour and liquid phases, the vapour and liquid flow rates, the temperature, pressure, and liquid holdup are state variables of each tray. The rigorous model is a set of nonlinear differential and algebraic equations (DAEs) which is solved by conventional Newton-Raphson algorithm with orthogonal collocation discretization. The proposed model is with high precision and its maximum error is less than 3%.The model can be applied to further study of dynamic optimization and advanced control of distillation processes.
Keywords :
Newton-Raphson method; differential algebraic equations; distillation; nonlinear differential equations; process control; Newton Raphson algorithm; component composition; distillation process; dynamic optimization; liquid flow rate; nonlinear algebraic equation; nonlinear differential equation; orthogonal collocation discretization; rigorous dynamic model; vapour flow rate; Automatic control; Automation; Chemical industry; Differential algebraic equations; Error correction; Feeds; Fluid flow; Nonlinear equations; Process control; Temperature;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Control and Automation (ICCA), 2010 8th IEEE International Conference on
Conference_Location :
Xiamen
ISSN :
1948-3449
Print_ISBN :
978-1-4244-5195-1
Electronic_ISBN :
1948-3449
Type :
conf
DOI :
10.1109/ICCA.2010.5524130
Filename :
5524130
Link To Document :
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