DocumentCode
3216163
Title
Intense pulsed field emission of carbon nanotube film grown on electroless plated Ni substrate
Author
Zeng Fan-Guang ; Xin Li ; Liansheng Xia ; Zhang Rui
Author_Institution
Dept. of Math. & Phys., Zhengzhou Inst. of Aeronaut. Ind. Manage., Zhengzhou, China
fYear
2010
fDate
14-16 Oct. 2010
Firstpage
548
Lastpage
549
Abstract
In this paper, intense pulsed field emission of carbon nanotube film grown on electroless plated Ni substrate is presented. Ni substrate used for CNT film growth was prepared on Si wafer (2 inches diameter) by using electroless plating process in plating solution composed of nickel sulfate and assistant. Palladium catalyst was used for Ni plating. CNT film was synthesized by the pyrolysis of FePc.
Keywords
carbon nanotubes; catalysts; electroless deposition; field emission; nanofabrication; pyrolysis; thin films; C; Ni; carbon nanotube film; catalyst; electroless plated substrate; pulsed field emission; pyrolysis;
fLanguage
English
Publisher
ieee
Conference_Titel
Vacuum Electron Sources Conference and Nanocarbon (IVESC), 2010 8th International
Conference_Location
Nanjing
Print_ISBN
978-1-4244-6645-0
Type
conf
DOI
10.1109/IVESC.2010.5644201
Filename
5644201
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