The optical spectra analysis of free oxygenic radicals in atmospheric microwave plasmas

Author

Wang, S.M. ; Zhang, G.X. ; Zhang, Q. ; Wang, X.X.

Author_Institution

Dept. of Electr. Eng. & Appl. Electron. Technol., Tsinghua Univ., Beijing, China

fYear

2009

fDate

1-5 June 2009

Firstpage

1

Lastpage

1

Abstract

Summary form only given. This paper analyzes the emission spectra of atmospheric microwave Ar-air plasma and He-air plasma at the range of 200 to 1000 nm; diagnoses the free oxygenic radicals of them. Results reveal that, free oxygenic radicals occupy large proportion of all elements in the spectra of Ar-air and He-air plasmas. OH free radicals are strong near the 309-314 nm band compared with He atomic spectra lines whose comparative intensity very low in He-air plasma. In opposition, NO free radicals and other nitrogen oxides are more than OH radicals in Ar-air plasma. The intensity of free oxygenic radicals in He-air plasma is obvious weaker than in Ar-air plasma, and it changes comply with input energy and gas flow rate.

Keywords

air; argon; free radicals; helium; high-frequency discharges; plasma chemistry; plasma diagnostics; plasma flow; Ar-O₂; He-O₂; atmospheric microwave plasmas; free oxygenic radicals; gas flow rate; optical spectra analysis; wavelength 200 nm to 1000 nm; Atmospheric-pressure plasmas; Atomic measurements; Discharges; Helium; Laboratories; Microwave technology; Nitrogen; Plasma diagnostics; Plasma waves; Stimulated emission;

fLanguage

English

Publisher

ieee

Conference_Titel

Plasma Science - Abstracts, 2009. ICOPS 2009. IEEE International Conference on

Conference_Location

San Diego, CA

ISSN

0730-9244

Print_ISBN

978-1-4244-2617-1

Type

conf

DOI

10.1109/PLASMA.2009.5227540

Filename

5227540