DocumentCode :
3216556
Title :
Phosphoric acid processing time has effects on the field emission property of W18O49 nanowires
Author :
Mo, F.Y. ; Fei Liu ; Sun, Rui ; Chen, Z.S. ; Liu, Q.R. ; Deng, S.Z. ; Xu, N.S.
Author_Institution :
State Key Lab. of Optoelectron. Mater. & Technol., Sun Yat-sen Univ., Guangzhou, China
fYear :
2010
fDate :
14-16 Oct. 2010
Firstpage :
524
Lastpage :
524
Abstract :
The authors have developed a new method to fabricate patterned W18O49 nanowire arrays by combination of thermal evaporation and lift-off technology. It is found that the phosphoric acid processing of the lift-off technology has strong effect on the field emission property of W18O49 nanowires.
Keywords :
evaporation; field emission; nanofabrication; nanopatterning; nanowires; tungsten compounds; W18O49; field emission property; lift-off technology; nanofabrication; patterned nanowire arrays; phosphoric acid processing time; thermal evaporation; Educational institutions; Nanowires;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Vacuum Electron Sources Conference and Nanocarbon (IVESC), 2010 8th International
Conference_Location :
Nanjing
Print_ISBN :
978-1-4244-6645-0
Type :
conf
DOI :
10.1109/IVESC.2010.5644219
Filename :
5644219
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=3216556
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