Title :
Study of controlled growth of carbon nanotubes in microstructures at low temperature
Author :
Yang, Dong ; Jun Chen ; Deng, S.Z. ; Xu, N.S.
Author_Institution :
State Key Lab. of Optoelectron. Mater. & Technol., Sun Yat-sen Univ., Guangzhou, China
Abstract :
In this paper, thermal-catalytic chemical vapor deposition (thermal-CVD) is used to improve the quality of carbon nanotubes (CNTs) by varying the thickness of catalyst (Ni), processing time of the hydrogen treatment, flow rate of reaction gas (C2H2). And also the properties of CNTs on different buffer layers (W,Ti, etc) in microstructures on glass substrates are studied. The grown CNTs are examined by scanning electron microscopy (SEM) and the field emission properties are presented.
Keywords :
buffer layers; carbon nanotubes; chemical vapour deposition; crystal microstructure; field emission; nanofabrication; scanning electron microscopy; C-Ti-SiO2; C-W-SiO2; CVD; SEM; SiO2; buffer layers; carbon nanotubes; field emission properties; flow rate; glass substrates; hydrogen treatment; microstructures; scanning electron microscopy; thermal-catalytic chemical vapor deposition;
Conference_Titel :
Vacuum Electron Sources Conference and Nanocarbon (IVESC), 2010 8th International
Conference_Location :
Nanjing
Print_ISBN :
978-1-4244-6645-0
DOI :
10.1109/IVESC.2010.5644222
