Title :
Low voltage operation of plasma focus at low energies
Author :
Shukla, R. ; Sharma, S.K. ; Shyam, A. ; Banerjee, P. ; Deb, P. ; Prabahar, T. ; Adhikary, B. ; Shah, K.G.
Author_Institution :
Energetics & Electromagn. Div., Bhabha Atomic Res. Centre, Mumbai, India
Abstract :
Summary form only given. Compact and low energy plasma foci have found many applications in recent years and hence attracted plasma physics scientists and engineers for research. In this paper we are presenting a low energy plasma focus les 36 Joules and voltages les 4 kV. The initiation of surface breakdown at low voltages and thereafter leading to focusing action in plasma focus is being reported with experimentally found evidences in this article. There is enough reported data for low energy operation of plasma focus operating at > 50 J and < 0.25 J but the energy band between these limits could not be extensively explored so far for the reasons of compact energy storage power supply with low self impedance delivering high currents to plasma focus. Our present system delivers 40 kA at 4 kV in plasma focus. We are attracted towards this zone of operation for the reasons of solid state switching possibilities and repetitive operation at low operating voltages. This system can be used for illicit material detection.
Keywords :
pinch effect; plasma applications; plasma focus; plasma production; compact plasma focus; current 40 kA; illicit material detection; low energy low voltage plasma focus; low energy plasma focus; repetitive low voltage operation; solid state switching; surface breakdown initiation; voltage 4 kV; Breakdown voltage; Energy storage; Impedance; Low voltage; Physics; Plasma applications; Plasma materials processing; Power engineering and energy; Power supplies; Solid state circuits;
Conference_Titel :
Plasma Science - Abstracts, 2009. ICOPS 2009. IEEE International Conference on
Conference_Location :
San Diego, CA
Print_ISBN :
978-1-4244-2617-1
DOI :
10.1109/PLASMA.2009.5227568