DocumentCode
3216860
Title
Development of a pulse driven micro-electrical discharge machining for micro-hole boring
Author
Chang-Seung Ha ; Dong-Hyun Kim ; Ho-Jun Lee ; Hae June Lee ; Hyun Seok Tak ; Myung Chang Kang
Author_Institution
Dept. of Electr. Eng., Pusan Nat. Univ., Pusan, South Korea
fYear
2009
fDate
1-5 June 2009
Firstpage
1
Lastpage
1
Abstract
Recently, the needs of integrated system for micro-machining and measurement have been increased with the appearance of micro-factory system. For boring electro-conductive high hardness material such as tungsten carbide (WC), an electrical discharge machining (EDM) is much more practical than conventional machining to bore these materials since hardness is not a dominant parameter in EDM. In this study, a pulse driven micro-EDM device for the treatment of conductive high-hardness material is suggested and the micro-hole machining by arc erosion is presented using the method. The characteristics of the developed EDM were analyzed in terms of the electro-optical observation. The discharge images were captured by ICCD camera. Resistance and capacitance are important parameters for EDM. They determine the time constant (tau=RC), so that they decide discharge frequency. Pulsed power broadens the restriction of RC parameters compare with a RC discharge EDM. The pulse driven EDM can change both the discharge frequency and the capacitance for discharge.
Keywords
arcs (electric); boring; electrical discharge machining; micromachining; plasma diagnostics; plasma materials processing; tungsten compounds; ICCD camera; RC discharge EDM; arc erosion; capacitance; discharge frequency; electroconductive high-hardness material; electrooptical observation; microfactory system; microhole boring; micromachining; pulse driven microelectrical discharge machining; resistance; time constant; tungsten carbide; Boring; Cameras; Capacitance; Conducting materials; Electric variables measurement; Frequency; Machine tools; Machining; Optical wavelength conversion; Tungsten;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science - Abstracts, 2009. ICOPS 2009. IEEE International Conference on
Conference_Location
San Diego, CA
ISSN
0730-9244
Print_ISBN
978-1-4244-2617-1
Type
conf
DOI
10.1109/PLASMA.2009.5227569
Filename
5227569
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