DocumentCode :
3218618
Title :
Analysis of thermoelectric and thermomechanical effects in MOSFETs
Author :
Krishnamoorthy, Shriram ; Chowdhury, Masud H.
Author_Institution :
Electr. & Comput. Eng., Univ. of Illinois at Chicago, Chicago, IL, USA
fYear :
2008
fDate :
14-17 Dec. 2008
Firstpage :
200
Lastpage :
203
Abstract :
As the dimensions of transistors continue to shrink, the effect of self-heating becomes more pronounced. With such downscaling, the thermal conductivity of ultra-thin body transistors causes considerable change in electrical and mechanical properties of the device. This paper investigates the thermo-electric and the thermo-mechanical effects of stresses and strains in MOSFETs. Nanoscale device dimensions and complicated device geometries coupled with novel but thermally insulating materials build up a stress along the channel and drain of the MOSFET. The stress and strain in these thin refractory layers affect the mobility of the carriers and the drain current. Here an analysis of the impacts of stress and strain on the electrical performance of MOSFETs is presented.
Keywords :
MOSFET; carrier mobility; elemental semiconductors; nanoelectronics; silicon; stress-strain relations; thermoelectricity; thermomechanical treatment; MOSFET; Si; carrier mobility; device geometry; drain current; electrical performance; nanoscale device dimensions; strains; stresses; thermally insulating materials; thermoelectric effect; thermomechanical effect; thin refractory layers; Capacitive sensors; Geometry; MOSFETs; Mechanical factors; Nanoscale devices; Thermal conductivity; Thermal stresses; Thermoelectricity; Thermomechanical processes; Transistors;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microelectronics, 2008. ICM 2008. International Conference on
Conference_Location :
Sharjah
Print_ISBN :
978-1-4244-2369-9
Electronic_ISBN :
978-1-4244-2370-5
Type :
conf
DOI :
10.1109/ICM.2008.5393769
Filename :
5393769
Link To Document :
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