Field electron emission from hydrogen plasma treated nano-ZnO thin films

Author

Wang Xiao-ping ; Zhang Shi ; Zhu Yu-zhuan ; Wang Li-jun ; Li Huai-hui ; Liu Xin-xin ; Mei Cui-yu

Author_Institution

Coll. of Sci., Univ. of Shanghai for Sci. & Technol., Shanghai, China

fYear

2010

fDate

14-16 Oct. 2010

Firstpage

326

Lastpage

327

Abstract

This paper presents field electron emission current density of the hydrogen plasma treated nano-ZnO thin films. The surface morphology, microstructure and surface resistance of nano-ZnO thin films deposited on Mo layer are characterized by X-ray diffraction pattern (XRD), field emission scanning electron microscopy (FE-SEM), energy dispersive spectrum (EDS) and surface resistance meter.

Keywords

II-VI semiconductors; X-ray chemical analysis; X-ray diffraction; current density; electron beam deposition; electron field emission; field emission electron microscopy; nanostructured materials; plasma CVD; scanning electron microscopy; semiconductor growth; semiconductor thin films; surface morphology; surface resistance; wide band gap semiconductors; zinc compounds; EDS; FESEM; Mo; X-ray diffraction pattern; XRD; ZnO; electron beam vapor deposition; energy dispersive spectrum; field electron emission current density; field emission scanning electron microscopy; hydrogen plasma treated nanostructured thin films; microstructure; microwave plasma chemical vapor deposition; surface morphology; surface resistance;

fLanguage

English

Publisher

ieee

Conference_Titel

Vacuum Electron Sources Conference and Nanocarbon (IVESC), 2010 8th International

Conference_Location

Nanjing

Print_ISBN

978-1-4244-6645-0

Type

conf

DOI

10.1109/IVESC.2010.5644328

Filename

5644328