DocumentCode :
3219337
Title :
Surface Study of Nb/Cu Films for Cavity Deposition by ECR Plasma
Author :
Wu, A.T. ; Ike, R. ; Phillips, H.L. ; Valente, A.-M. ; Wang, H. ; Wu, G.
Author_Institution :
Thomas Jefferson National Accelerator Facility, Newport News, VA 23606, USA, andywu@jlab.org
fYear :
2005
fDate :
16-20 May 2005
Firstpage :
4153
Lastpage :
4155
Abstract :
Niobium (Nb) thin film deposited on copper (Cu) cavities through electron cyclotron resonance (ECR) plasma appears to be an attractive alternative technique for fabricating superconducting radio frequency cavities to be used in particle accelerators. The performance of these obtained Nb/Cu cavities is expected to depend on the surface characteristics of the Nb films. In this report, we investigate the influence of deposition energy on surface morphology, microstructure, and chemical composition of Nb films deposited on small Cu disks employing a metallographic optical microscope, a 3-D profilometer, a scanning electron microscope, and a dynamic secondary ion mass spectrometry. The results will be compared with those obtained on Nb surfaces treated by BCP, EP, and BEP.
Keywords :
Copper; Niobium; Optical films; Optical microscopy; Plasma accelerators; Scanning electron microscopy; Superconducting films; Superconducting thin films; Surface morphology; Surface treatment;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Particle Accelerator Conference, 2005. PAC 2005. Proceedings of the
Print_ISBN :
0-7803-8859-3
Type :
conf
DOI :
10.1109/PAC.2005.1591748
Filename :
1591748
Link To Document :
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