Title :
Field emission enhancement in laser annealed carbon films
Author :
Tay, B.K. ; Shakerzadeh, M.
Author_Institution :
Sch. of Electr. & Electron. Eng., Nanyang Technol. Univ., Singapore, Singapore
Abstract :
In this paper the effect of single nanosecond laser pulse irradiation on the microstructure and field emission (FE) properties of carbon films is studied. Amorphous carbon films are exposed to a single pulse of a 248 nm excimer laser with pulse width of 23 nsec and varying energies. Microstructural changes of the films are investigated by Raman spectroscopy, transmission electron microscopy and electron energy loss spectroscopy. FE study is conducted in a parallel plate configuration. It is found that the landscape of the FE properties is not directly correlated to the laser energy in a simple way. The intrinsic biaxial compressive stress of carbon films results in formation of preferred orientation in graphitic basal planes provided that the sufficient activation energy is supplied to the system.
Keywords :
Raman spectra; carbon; compressive strength; electron energy loss spectra; field emission; internal stresses; laser beam annealing; noncrystalline structure; texture; thin films; transmission electron microscopy; C; Raman spectroscopy; activation energy; amorphous carbon films; electron energy loss spectroscopy; field emission properties; graphitic basal planes; intrinsic biaxial compressive stress; laser annealed carbon films; microstructure; nanosecond laser pulse irradiation; parallel plate configuration; preferred orientation; transmission electron microscopy; wavelength 248 nm;
Conference_Titel :
Vacuum Electron Sources Conference and Nanocarbon (IVESC), 2010 8th International
Conference_Location :
Nanjing
Print_ISBN :
978-1-4244-6645-0
DOI :
10.1109/IVESC.2010.5644368
