DocumentCode
3219835
Title
Unified Planar Process For Fabricating Heterojunction Bipolar Transistors And Buried Heterostructure Lasers Utilizing Impurity Induced Disordering
Author
Thornton, R.L. ; Mosby, W.J. ; Chung, H.F.
Author_Institution
Xerox Palo Alto Research Center
fYear
1988
fDate
2-4 Nov 1988
Firstpage
29
Lastpage
30
Keywords
Contact resistance; Current-voltage characteristics; Doping; Epitaxial layers; Heterojunction bipolar transistors; Optical pulses; Threshold current;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics Society Annual Meeting, 1988. Conference Proceedings. LEOS '88.
Type
conf
DOI
10.1109/LEOS.1988.689755
Filename
689755
Link To Document