DocumentCode
3219853
Title
A high density hydrogen-based capillary plasma source and its potential applications for the plasma wakefield accelerators
Author
Chen, H. ; Kallos, E. ; Muggli, P. ; Katsouleas, T.C. ; Gundersen, M.A.
Author_Institution
Electr. Eng.-Electrophys., Univ. of Southern California, Los Angeles, CA, USA
fYear
2009
fDate
1-5 June 2009
Firstpage
1
Lastpage
1
Abstract
Summary form only given. Capillary plasmas are typically generated in insulated tubes with the internal diameter ranging from tens of micrometers to several millimeters. It is convenient to produce a pulsed discharge either by ionizing a gas that fills the capillary or by ablation of the capillary wall and electrodes. We report the generation of variable plasma densities up to 1019 cm-3 in hydrogen-filled capillary discharges, and consider their applications as a practical plasma source for particle-beam- driven plasma wakefield accelerators. The capillary consists of a transparent, cylindrical borosilicate glass tube with inner diameter less than 1 mm. Stark broadening of the H?? line and the ratio of the light emitted under two Balmer lines are used to characterize the plasma density and plasma temperature respectively. The time resolved plasma density is found to decay exponentially with a typical time constant of several hundreds of nanoseconds. The time delay between the discharge and the drive electron beam can therefore be tuned to reach the density appropriate for the maximum acceleration gradient. The dependence of the plasma density on the capillary geometry and gas pressure and implications of the results for beam-driven plasma accelerators are discussed.
Keywords
Stark effect; discharges (electric); plasma accelerators; plasma density; plasma sources; plasma temperature; spectral line broadening; time resolved spectra; Balmer lines; Stark broadening; cylindrical borosilicate glass tube; electron beam; gas pressure; high-density hydrogen-based capillary plasma source; hydrogen-filled capillary discharges; particle-beam-driven plasma wakefield accelerators; plasma density; plasma temperature; plasma wakefield accelerator applications; pulsed discharge; time-resolved spectra; Acceleration; Electrodes; Fault location; Insulation; Ion accelerators; Particle accelerators; Plasma accelerators; Plasma applications; Plasma density; Plasma sources;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science - Abstracts, 2009. ICOPS 2009. IEEE International Conference on
Conference_Location
San Diego, CA
ISSN
0730-9244
Print_ISBN
978-1-4244-2617-1
Type
conf
DOI
10.1109/PLASMA.2009.5227705
Filename
5227705
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