DocumentCode :
3219868
Title :
The effects of chemical cleaning on impregnant removal as a function of impregnant type [dispenser cathodes]
Author :
Farrell, JJ ; Conkwright, S. ; Tarter, JO
Author_Institution :
Semicon Associates, Lexington, KY, USA
fYear :
2004
fDate :
27-29 April 2004
Firstpage :
297
Lastpage :
298
Abstract :
Summary form only given. A liquid cleaning technique, commonly referred to as SRLV or EDTA cleaning, is often used to clean the emitting surface of dispenser cathodes. The process is based on chemical chelating and removes a shallow layer of impregnant material from the impregnated tungsten matrix. This produces a cathode with more predictable activation behavior and reduces initial evaporation products. Additionally, a thoroughly cleaned surface enhances sputtered coatings adhesion. This investigation reports on the amount of impregnant removed as a function of impregnant type and as a function of time. Methods used to evaluate the amount of material removed include copper back filling and metallographic sampling. Variability in the data is primarily due to the complexity of the BaO-CaO-Al2O3 oxide system and the impregnation process.
Keywords :
aluminium compounds; barium compounds; calcium compounds; cathodes; metallography; surface cleaning; tungsten; BaO-CaO-Al2O3-W; EDTA; SRLV; cathode activation behavior; chemical chelating; chemical cleaning effects; copper back filling; dispenser cathode emitting surface; evaporation products; impregnant material removal; impregnated tungsten matrix; liquid cleaning technique; metallographic sampling; sputtered coatings adhesion; Adhesives; Cathodes; Chemical processes; Coatings; Copper; Filling; Inorganic materials; Sampling methods; Surface cleaning; Tungsten;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Vacuum Electronics Conference, 2004. IVEC 2004. Fifth IEEE International
Print_ISBN :
0-7803-8261-7
Type :
conf
DOI :
10.1109/IVELEC.2004.1316326
Filename :
1316326
Link To Document :
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