• DocumentCode
    3220502
  • Title

    GaAs photonic crystals on SiO/sub 2/ fabricated by VHF anode-coupled RIE and wafer bonding

  • Author

    Saitoh, T. ; Sogawa, T. ; Notomi, M. ; Tamamura, T. ; Kodama, S. ; Furuta, T. ; Ando, H.

  • Author_Institution
    NTT Basic Res. Labs., Kanagawa, Japan
  • fYear
    1999
  • fDate
    6-8 July 1999
  • Firstpage
    22
  • Lastpage
    23
  • Abstract
    Semiconductor photonic crystals (PCs) are attracting much attention from the viewpoints of both physical interest and optoelectronic applications that take advantage of controlling optical transitions. In order to make crystals with the photonic band-gaps in the optical wavelength region, it is required to fabricate well-defined periodic structures on the order of the wavelength of light. Furthermore, a confinement structure in the vertical direction is also important in the 2-dimensional (2D) PCs. We have fabricated GaAs 2D PCs on SiO/sub 2/ which are suitable for waveguide applications in the lateral directions.
  • Keywords
    III-V semiconductors; gallium arsenide; photonic band gap; semiconductor growth; sputter etching; wafer bonding; GaAs; GaAs photonic crystals on SiO/sub 2/; SiO/sub 2/; VHF anode-coupled RIE; wafer bonding; Gallium arsenide; Photonic crystals; Reflectivity; Temperature measurement; Wafer bonding; Wavelength measurement;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microprocesses and Nanotechnology Conference, 1999. Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International
  • Conference_Location
    Yokohama, Japan
  • Print_ISBN
    4-930813-97-2
  • Type

    conf

  • DOI
    10.1109/IMNC.1999.797457
  • Filename
    797457