DocumentCode :
3220502
Title :
GaAs photonic crystals on SiO/sub 2/ fabricated by VHF anode-coupled RIE and wafer bonding
Author :
Saitoh, T. ; Sogawa, T. ; Notomi, M. ; Tamamura, T. ; Kodama, S. ; Furuta, T. ; Ando, H.
Author_Institution :
NTT Basic Res. Labs., Kanagawa, Japan
fYear :
1999
fDate :
6-8 July 1999
Firstpage :
22
Lastpage :
23
Abstract :
Semiconductor photonic crystals (PCs) are attracting much attention from the viewpoints of both physical interest and optoelectronic applications that take advantage of controlling optical transitions. In order to make crystals with the photonic band-gaps in the optical wavelength region, it is required to fabricate well-defined periodic structures on the order of the wavelength of light. Furthermore, a confinement structure in the vertical direction is also important in the 2-dimensional (2D) PCs. We have fabricated GaAs 2D PCs on SiO/sub 2/ which are suitable for waveguide applications in the lateral directions.
Keywords :
III-V semiconductors; gallium arsenide; photonic band gap; semiconductor growth; sputter etching; wafer bonding; GaAs; GaAs photonic crystals on SiO/sub 2/; SiO/sub 2/; VHF anode-coupled RIE; wafer bonding; Gallium arsenide; Photonic crystals; Reflectivity; Temperature measurement; Wafer bonding; Wavelength measurement;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microprocesses and Nanotechnology Conference, 1999. Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International
Conference_Location :
Yokohama, Japan
Print_ISBN :
4-930813-97-2
Type :
conf
DOI :
10.1109/IMNC.1999.797457
Filename :
797457
Link To Document :
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