DocumentCode
3220502
Title
GaAs photonic crystals on SiO/sub 2/ fabricated by VHF anode-coupled RIE and wafer bonding
Author
Saitoh, T. ; Sogawa, T. ; Notomi, M. ; Tamamura, T. ; Kodama, S. ; Furuta, T. ; Ando, H.
Author_Institution
NTT Basic Res. Labs., Kanagawa, Japan
fYear
1999
fDate
6-8 July 1999
Firstpage
22
Lastpage
23
Abstract
Semiconductor photonic crystals (PCs) are attracting much attention from the viewpoints of both physical interest and optoelectronic applications that take advantage of controlling optical transitions. In order to make crystals with the photonic band-gaps in the optical wavelength region, it is required to fabricate well-defined periodic structures on the order of the wavelength of light. Furthermore, a confinement structure in the vertical direction is also important in the 2-dimensional (2D) PCs. We have fabricated GaAs 2D PCs on SiO/sub 2/ which are suitable for waveguide applications in the lateral directions.
Keywords
III-V semiconductors; gallium arsenide; photonic band gap; semiconductor growth; sputter etching; wafer bonding; GaAs; GaAs photonic crystals on SiO/sub 2/; SiO/sub 2/; VHF anode-coupled RIE; wafer bonding; Gallium arsenide; Photonic crystals; Reflectivity; Temperature measurement; Wafer bonding; Wavelength measurement;
fLanguage
English
Publisher
ieee
Conference_Titel
Microprocesses and Nanotechnology Conference, 1999. Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International
Conference_Location
Yokohama, Japan
Print_ISBN
4-930813-97-2
Type
conf
DOI
10.1109/IMNC.1999.797457
Filename
797457
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