DocumentCode :
3220659
Title :
Y-junction silicon carbide nanowires
Author :
Song, Hongbin ; Jiang, Hongbo ; Cao, L.Z. ; Li, Zhi Min ; Li, D.B. ; Miao, G.Q. ; Sun, X.J. ; Chen, Y.Z.
Author_Institution :
Key Lab. of Excited State Processes, Chinese Acad. of Sci., Changchun, China
fYear :
2010
fDate :
14-16 Oct. 2010
Firstpage :
77
Lastpage :
77
Abstract :
Summary form only given. Silicon carbide nanowires with junctions are considered to be of potential value in nanoelectronics. A simple method by catalyst-assisted vapor-liquid-solid reaction for producting Y-junction silicon carbide nanowires is described. The Y-junction silicon carbide nanowires are investigated by scanning electron microscopy (SEM) and transmission electron microscopy (TEM). It is found that all the Y-junctions have a predominant branching angle around 90°C, roughly twice the reported bending angle of single bend junctions. The reasons of formation Y-junction may be caused by gas flow fluctuate as reported in reference. This finding provides a possibility for SiC nanowires application in nanoelectronics.
Keywords :
nanofabrication; nanowires; scanning electron microscopy; semiconductor growth; semiconductor quantum wires; silicon compounds; transmission electron microscopy; wide band gap semiconductors; SEM; SiC; TEM; Y-junction silicon carbide nanowires; bending angle; catalyst-assisted vapor-liquid-solid reaction; gas flow fluctuation; nanoelectronics; predominant branching angle; scanning electron microscopy; single bend junctions; transmission electron microscopy; Nanowires; Formation mechanism; Gas flow fluctuate; SiC nanowires; Y-junction;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Vacuum Electron Sources Conference and Nanocarbon (IVESC), 2010 8th International
Conference_Location :
Nanjing
Print_ISBN :
978-1-4244-6645-0
Type :
conf
DOI :
10.1109/IVESC.2010.5644419
Filename :
5644419
Link To Document :
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