Title :
Development of kHz F/sub 2/ laser for 157 nm lithography
Author :
Nagai, S. ; Enami, T. ; Nishisaka, T. ; Fujimoto, J. ; Wakabayashi, O. ; Mizoguchi, H.
Author_Institution :
Laser Res. Dept., Komatsu Ltd., Kanagawa, Japan
Abstract :
We have been developing a high repetition rate discharge-pumped molecular fluorine laser for 157 nm microlithography. We have developed a high repetition rate solid state pulsed power module (SSPPM) up to 800 Hz. This laser adopts a stable resonator composed of a MgF/sub 2/ high reflection plane mirror and a MgF/sub 2/ output coupler, which show high transmittance and durability for VUV light. To avoid attenuation of the 157 nm radiation due to the absorption of O/sub 2/, all the optical path including optics and detectors are continually flushed by pure nitrogen at least below 100 ppm O/sub 2/ concentration.
Keywords :
fluorine; gas lasers; photolithography; 157 nm; 800 Hz; F/sub 2/; F/sub 2/ laser; discharge-pumped molecular fluorine laser; high reflection plane mirror; microlithography; solid state pulsed power module; stable resonator; Laser stability; Mirrors; Multichip modules; Optical attenuators; Optical pulses; Optical reflection; Optical resonators; Power lasers; Solid lasers; Solid state circuits;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 1999. Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International
Conference_Location :
Yokohama, Japan
Print_ISBN :
4-930813-97-2
DOI :
10.1109/IMNC.1999.797478
