X-ray and EUV liquid-jet-target laser-plasma sources based on solutions and cryogenic liquids

Author

Hansson, B.A.M. ; Rymell, L. ; Berglund, M. ; Hertz, H.M.

Author_Institution

Dept. of Biomed. & X-ray Phys., R. Inst. of Technol., Stockholm, Sweden

fYear

1999

fDate

6-8 July 1999

Firstpage

100

Abstract

Here we report on new experiments, extending the laser produced plasma source´s applicability for lithography by producing liquid-jet targets of substances that are gases or solids at normal pressure and temperature. This development is important since new wavelength ranges become accessible. Furthermore, the possibility to chose high-Z target material should lead to higher conversion efficiencies.

Keywords

X-ray lithography; X-ray production; cryogenics; jets; light sources; plasma applications; plasma production by laser; ultraviolet lithography; EUV liquid-jet-target laser-plasma sources; X-ray liquid-jet-target laser-plasma sources; conversion efficiencies; cryogenic liquids; high-Z target material; laser produced plasma source; liquid-jet targets; lithography; wavelength ranges; Atmospheric-pressure plasmas; Gas lasers; Lithography; Plasma materials processing; Plasma sources; Plasma temperature; Plasma waves; Plasma x-ray sources; Solid lasers; X-ray lasers;

fLanguage

English

Publisher

ieee

Conference_Titel

Microprocesses and Nanotechnology Conference, 1999. Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International

Conference_Location

Yokohama, Japan

Print_ISBN

4-930813-97-2

Type

conf

DOI

10.1109/IMNC.1999.797496

Filename

797496