Title :
Energy intensity distribution on thinned X-ray mask substrate in 100 kV electron beam writing
Author :
Aya, S. ; Murakami, T. ; Kise, K. ; Kitamura, K. ; Yabe, H. ; Marumoto, K. ; Safoh, S.
Author_Institution :
Advanced Technol. R&D Centre, Mitsubishi Electr. Corp., Hyogo, Japan
Abstract :
In this work the authors have evaluated the energy intensity distributions on thinned x-ray masks by the combination of the dot exposure and line exposure methods in 100 kV electron beam writing.
Keywords :
X-ray masks; electron beam lithography; electron resists; proximity effect (lithography); dot exposure; electron beam writing; energy intensity distribution; line exposure methods; proximity effect; resists; thinned X-ray mask substrate; thinned x-ray masks; Acceleration; Argon; Biomembranes; Electron beams; Proximity effect; Resists; Silicon carbide; Voltage; Writing; X-ray scattering;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 1999. Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International
Conference_Location :
Yokohama, Japan
Print_ISBN :
4-930813-97-2
DOI :
10.1109/IMNC.1999.797497
