DocumentCode :
3221370
Title :
Deposition of Ti/C nano-composite thin films by magnetron DC sputtering using dual targets
Author :
Sonoda, Takuji ; Nakao, Satomi ; Ikeyama, M.
Author_Institution :
Nat. Inst. of Adv. Ind. Sci. & Technol. (AIST), Nagoya, Japan
fYear :
2010
fDate :
14-16 Oct. 2010
Firstpage :
338
Lastpage :
338
Abstract :
Deposition of Ti/C nanocomposite thin films by magnetron DC sputtering was examined using dual targets of titanium and carbon, in order to investigate the effects of the distribution of titanium atoms and carbon atoms in the films on their surface morphology and their mechanical properties or physical properties. The Ti/C nano-composite thin films were deposited on glass substrates in the atmosphere of argon at the pressure of 0.4Pa by co-sputtering of both a titanium target and a carbon one.
Keywords :
carbon; hardness; nanocomposites; nanofabrication; sputter deposition; surface morphology; thin films; titanium; SiO2; Ti-C; argon atmosphere; carbon atoms; dual targets; glass substrates; magnetron DC sputter deposition; mechanical properties; nanocomposite thin films; pressure 0.4 Pa; surface morphology; titanium atoms; Atomic layer deposition; Films;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Vacuum Electron Sources Conference and Nanocarbon (IVESC), 2010 8th International
Conference_Location :
Nanjing
Print_ISBN :
978-1-4244-6645-0
Type :
conf
DOI :
10.1109/IVESC.2010.5644453
Filename :
5644453
Link To Document :
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