• DocumentCode
    3221822
  • Title

    Self limiting etching of piezoelectric crystals

  • Author

    Lakin, K.M. ; Kline, G.R. ; McCarron, K.T.

  • Author_Institution
    TFR Technol. Inc., Redmond, OR, USA
  • fYear
    1995
  • fDate
    31 May-2 Jun 1995
  • Firstpage
    827
  • Lastpage
    831
  • Abstract
    Piezoelectric plates have been thinned by various techniques including chemical and plasma etching, This paper reports on a novel method of plasma thinning piezoelectric plates in order to make high frequency resonators in inverted mesa or other configurations. The method involves using plasma excitation at the frequency where resonance is desired. Theoretical and experimental results are presented
  • Keywords
    crystal resonators; quartz; sputter etching; high frequency resonators; inverted mesa configuration; piezoelectric crystals; piezoelectric plates; plasma etching; plasma excitation; self limiting etching; Etching; Impedance; Plasma applications; Plasma chemistry; Plasma devices; Plasma materials processing; Plasma sources; Radio frequency; Resonant frequency; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Frequency Control Symposium, 1995. 49th., Proceedings of the 1995 IEEE International
  • Conference_Location
    San Francisco, CA
  • Print_ISBN
    0-7803-2500-1
  • Type

    conf

  • DOI
    10.1109/FREQ.1995.484091
  • Filename
    484091