DocumentCode
3221822
Title
Self limiting etching of piezoelectric crystals
Author
Lakin, K.M. ; Kline, G.R. ; McCarron, K.T.
Author_Institution
TFR Technol. Inc., Redmond, OR, USA
fYear
1995
fDate
31 May-2 Jun 1995
Firstpage
827
Lastpage
831
Abstract
Piezoelectric plates have been thinned by various techniques including chemical and plasma etching, This paper reports on a novel method of plasma thinning piezoelectric plates in order to make high frequency resonators in inverted mesa or other configurations. The method involves using plasma excitation at the frequency where resonance is desired. Theoretical and experimental results are presented
Keywords
crystal resonators; quartz; sputter etching; high frequency resonators; inverted mesa configuration; piezoelectric crystals; piezoelectric plates; plasma etching; plasma excitation; self limiting etching; Etching; Impedance; Plasma applications; Plasma chemistry; Plasma devices; Plasma materials processing; Plasma sources; Radio frequency; Resonant frequency; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Frequency Control Symposium, 1995. 49th., Proceedings of the 1995 IEEE International
Conference_Location
San Francisco, CA
Print_ISBN
0-7803-2500-1
Type
conf
DOI
10.1109/FREQ.1995.484091
Filename
484091
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