DocumentCode
3221967
Title
A micromachined sensor array using thin film resonators
Author
Xia, J. ; Burns, S. ; Porter, M. ; Xue, T. ; Liu, G. ; Wyse, R. ; Thielen, C.
Author_Institution
Ames Lab., Iowa State Univ., Ames, IA, USA
fYear
1995
fDate
31 May-2 Jun 1995
Firstpage
879
Lastpage
884
Abstract
This paper describes the design, modeling and implementation of a microsensor array using aluminum nitride thin film resonators. A finite element method, formulated to accommodate the anisotropic and piezoelectric properties of aluminum nitride, is used to model acoustic wave coupling between resonators and to define the mask design. Two arrays on the same aluminum nitride membrane were fabricated using standard semiconductor processing. The measurements were in agreement with the modeling. A multilayer Mason model was applied to investigate the mass loading and viscoelastic effects via hydrogen absorption on the PdNi coated TFR. The preliminary H2 sensitivity tests on a TFR hydrogen sensor are also presented
Keywords
aluminium compounds; arrays; crystal resonators; finite element analysis; gas sensors; masks; micromechanical resonators; microsensors; thin film devices; H2; PdNi-AlN; acoustic wave coupling; finite element method; gas sensor; mask design; mass loading; micromachined sensor array; multilayer Mason model; piezoelectric properties; sensitivity tests; thin film resonators; viscoelastic effects; Acoustic sensors; Aluminum nitride; Finite element methods; Hydrogen; Microsensors; Piezoelectric films; Semiconductor process modeling; Semiconductor thin films; Sensor arrays; Thin film sensors;
fLanguage
English
Publisher
ieee
Conference_Titel
Frequency Control Symposium, 1995. 49th., Proceedings of the 1995 IEEE International
Conference_Location
San Francisco, CA
Print_ISBN
0-7803-2500-1
Type
conf
DOI
10.1109/FREQ.1995.484099
Filename
484099
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