• DocumentCode
    3221967
  • Title

    A micromachined sensor array using thin film resonators

  • Author

    Xia, J. ; Burns, S. ; Porter, M. ; Xue, T. ; Liu, G. ; Wyse, R. ; Thielen, C.

  • Author_Institution
    Ames Lab., Iowa State Univ., Ames, IA, USA
  • fYear
    1995
  • fDate
    31 May-2 Jun 1995
  • Firstpage
    879
  • Lastpage
    884
  • Abstract
    This paper describes the design, modeling and implementation of a microsensor array using aluminum nitride thin film resonators. A finite element method, formulated to accommodate the anisotropic and piezoelectric properties of aluminum nitride, is used to model acoustic wave coupling between resonators and to define the mask design. Two arrays on the same aluminum nitride membrane were fabricated using standard semiconductor processing. The measurements were in agreement with the modeling. A multilayer Mason model was applied to investigate the mass loading and viscoelastic effects via hydrogen absorption on the PdNi coated TFR. The preliminary H2 sensitivity tests on a TFR hydrogen sensor are also presented
  • Keywords
    aluminium compounds; arrays; crystal resonators; finite element analysis; gas sensors; masks; micromechanical resonators; microsensors; thin film devices; H2; PdNi-AlN; acoustic wave coupling; finite element method; gas sensor; mask design; mass loading; micromachined sensor array; multilayer Mason model; piezoelectric properties; sensitivity tests; thin film resonators; viscoelastic effects; Acoustic sensors; Aluminum nitride; Finite element methods; Hydrogen; Microsensors; Piezoelectric films; Semiconductor process modeling; Semiconductor thin films; Sensor arrays; Thin film sensors;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Frequency Control Symposium, 1995. 49th., Proceedings of the 1995 IEEE International
  • Conference_Location
    San Francisco, CA
  • Print_ISBN
    0-7803-2500-1
  • Type

    conf

  • DOI
    10.1109/FREQ.1995.484099
  • Filename
    484099