DocumentCode
3222029
Title
A dynamic simulation of electron beam induced charging-up of insulators
Author
Kotera, M. ; Yamaguchi, K. ; Suga, H.
Author_Institution
Fac. of Eng., Osaka Inst. of Technol., Japan
fYear
1999
fDate
6-8 July 1999
Firstpage
166
Lastpage
167
Abstract
It is known that insulating materials charge-up negatively or positively depending on its condition during the electron beam (EB) irradiation. This charging disturbs various applications of EB technologies. In the present study a simulation model is proposed to express the charging mechanism of insulators as a function of time under EB irradiation The material studied here is PMMA which is a typical EB resist. In the simulation, the electron deposition distribution is calculated by a Monte Carlo simulation of electron trajectories in the specimen, where the production of secondary electrons and Auger electrons is taken into account. The electron yield obtained by the simulation for non-charged specimen agrees quite well with the experimental result, which has been obtained by using a pulse beam technique.
Keywords
Auger effect; Monte Carlo methods; electron beam effects; electron resists; polymers; secondary electron emission; semiconductor process modelling; surface charging; Auger electrons; EB resist; Monte Carlo simulation; PMMA; dynamic simulation; electron beam induced charging-up; electron deposition distribution; electron trajectories; electron yield; insulating materials; insulators; secondary electrons; simulation model; Conductivity; Electric potential; Electron beams; Information science; Insulation; Materials science and technology; Poisson equations; Production; Resists; Yield estimation;
fLanguage
English
Publisher
ieee
Conference_Titel
Microprocesses and Nanotechnology Conference, 1999. Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International
Conference_Location
Yokohama, Japan
Print_ISBN
4-930813-97-2
Type
conf
DOI
10.1109/IMNC.1999.797529
Filename
797529
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