DocumentCode :
3222201
Title :
Emission characteristics of amorphous silicon field emitter arrays sealed in a vacuum package
Author :
Gamo, H. ; Kai, T. ; Kanemaru, S. ; Itoh, J.
Author_Institution :
Electrotech. Lab., Ibaraki, Japan
fYear :
1999
fDate :
6-8 July 1999
Firstpage :
184
Lastpage :
185
Abstract :
A new and simple vacuum package has been designed and fabricated for measuring field emitter array (FEA) properties in practical use. We have measured emission characteristics of a-Si FEAs sealed in the vacuum package for the first time. Very stable emission current with fluctuations of less than 2% has been obtained at the TFT-FEA sealed in the vacuum package. From the experimental results, the TFT-FEA was found to be very promising for high performance applications, such as FEDs.
Keywords :
amorphous semiconductors; electron field emission; elemental semiconductors; field emission displays; seals (stoppers); semiconductor device packaging; silicon; vacuum microelectronics; Si; TFT-FEA; amorphous silicon; current stability; field emission display; field emitter arrays; sealed package; stable emission characteristics; vacuum package; Amorphous silicon; Anodes; Field emitter arrays; Gettering; Glass; Indium tin oxide; Packaging; Seals; Temperature; Thin film transistors;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microprocesses and Nanotechnology Conference, 1999. Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International
Conference_Location :
Yokohama, Japan
Print_ISBN :
4-930813-97-2
Type :
conf
DOI :
10.1109/IMNC.1999.797538
Filename :
797538
Link To Document :
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