Title :
An investigation of SEM overlay metrology
Author :
Koike, T. ; Ikeda, T. ; Abe, H. ; Komatsu, F.
Author_Institution :
Microelectron. Eng. Lab., Toshiba Corp., Yokohama, Japan
Abstract :
We examine the accuracy and precision of SEM-based overlay metrology in the case of marks covered with thick resist film. We measured the overlay error by optimizing beam condition, and compared the results with those obtained by optics-based measurement.
Keywords :
integrated circuit measurement; scanning electron microscopy; spatial variables measurement; SEM overlay metrology; overlay error; overlay marks; thick resist film; voltage contrast images; Acceleration; Accelerometers; Integrated circuit measurements; Laboratories; Metrology; Optical films; Resists; Semiconductor device measurement; Transistors; Voltage;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 1999. Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International
Conference_Location :
Yokohama, Japan
Print_ISBN :
4-930813-97-2
DOI :
10.1109/IMNC.1999.797541
