DocumentCode :
322235
Title :
Acoustic reflection coefficient of silicon wafers in megasonic cleaning tanks
Author :
Zang, Ming ; Kittelson, D.B. ; Kuehn, T.H. ; Gouk, R.
Author_Institution :
Dept. of Mech. Eng., Minneapolis Univ., Minneapolis, MN, USA
Volume :
1
fYear :
1997
fDate :
5-8 Oct 1997
Firstpage :
833
Abstract :
Reflection coefficients of silicon wafers in megasonic cleaning tanks have been determined theoretically and experimentally. The experimental results obtained indicate that the model of a layered solid in liquids is a good predictor of reflection coefficients for silicon wafers in liquids. At a frequency of about 1 MHz, high reflection from silicon wafers occurs at large incident angles. There are also two troughs of low reflection for incident angles between 0°-90°. The Young´s modulus and Poisson´s ratio of the silicon (110) orientation give the best agreement between the model and experimental results
Keywords :
Poisson ratio; Young´s modulus; acoustic wave reflection; elemental semiconductors; silicon; ultrasonic cleaning; 1 MHz; Poisson´s ratio; Si; Young´s modulus; acoustic reflection coefficient; incident angle; layered solid; megasonic cleaning tanks; silicon wafers; Acoustic reflection; Aluminum; Cleaning; Frequency; Glass; Liquids; Semiconductor device modeling; Silicon; Solid modeling; Underwater acoustics;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Ultrasonics Symposium, 1997. Proceedings., 1997 IEEE
Conference_Location :
Toronto, Ont.
ISSN :
1051-0117
Print_ISBN :
0-7803-4153-8
Type :
conf
DOI :
10.1109/ULTSYM.1997.663142
Filename :
663142
Link To Document :
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