مرکز منطقه ای اطلاع رساني علوم و فناوري

DocumentCode :

3222405

Title :

New Approaches To Excimer Laser Resists

Author :

Rothschild, M.

Author_Institution :

MIT

fYear :

1988

fDate :

2-4 Nov. 1988

Firstpage :

207

Lastpage :

209

Keywords :

Dry etching; Fluctuations; Image resolution; Lithography; Optical design; Optical materials; Optical pulses; Resists; Surface resistance; Wet etching;

fLanguage :

English

Publisher :

ieee

Conference_Titel :

Lasers and Electro-Optics Society Annual Meeting, 1988. Conference Proceedings. LEOS '88.

Conference_Location :

Santa Clara, CA, USA

Type :

conf

DOI :

10.1109/LEOS.1988.689806

Filename :

689806

Link To Document :

https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=3222405