DocumentCode :
3222504
Title :
Giga-era dielectric etch: challenges and solutions
Author :
Shan, H.
Author_Institution :
Dielectr. Etch Div., Appl. Mater. Inc., Santa Clara, CA, USA
fYear :
1999
fDate :
6-8 July 1999
Firstpage :
214
Lastpage :
215
Abstract :
Moore´s law has generally guided the semiconductor micro-fabrication for the last three decades. Along this trend, a giga era is approaching: gigabit memory devices and giga Hertz microprocessors will be developed around the millennium. The author first discusses both technological and economical challenges to dielectric etch of the gigaera, from a semiconductor equipment vendor´s point of view, then presents some of recently developed solutions.
Keywords :
etching; nanotechnology; dielectric etch; giga Hertz microprocessors; gigabit memory devices; semiconductor micro-fabrication; Art; Dielectric films; Dielectric materials; Etching; Microprocessors; Moore´s Law; Resists; Semiconductor device manufacture; Semiconductor films; Semiconductor materials;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microprocesses and Nanotechnology Conference, 1999. Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International
Conference_Location :
Yokohama, Japan
Print_ISBN :
4-930813-97-2
Type :
conf
DOI :
10.1109/IMNC.1999.797553
Filename :
797553
Link To Document :
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