DocumentCode :
3223458
Title :
Polarization-inverted multilayered pure shear mode AlN film resonator
Author :
Suzuki, Masashi ; Yanagitani, Takahiko
Author_Institution :
Grad. Sch. of Eng., Nagoya Inst. of Technol., Nagoya, Japan
fYear :
2011
fDate :
18-21 Oct. 2011
Firstpage :
312
Lastpage :
315
Abstract :
c-axis parallel AlN film is suitable for pure shear mode devices. Polarization-inverted multilayered structure can excite high order mode resonance. The film thickness of high order mode resonator is thicker than that of fundamental mode resonator in same operating frequency. Therefore, the multilayered resonator is expected to have high power handling capability. c-axis parallel polarization-inverted multilayered AlN films were fabricated by ion beam assisted deposition (IBAD). caxis parallel orientation was formed under the 3 kV accelerated ion beam irradiation. Shear mode resonator was prepared to investigate piezoelectric properties of the film. Only pure shear wave without any longitudinal wave was excited in the resonators. k15 was determined to be 0.05 and this value is 71 % of the single crystalline AlN. We considered that in-plane crystal growth direction should to be determined by the ion beam irradiation direction. c-axis parallel multilayer AlN film was fabricated by inverting in-plane beam irradiation direction. High order mode resonance was observed in the resonators, showing that polarization was inverted in the multilayer AlN films.
Keywords :
III-V semiconductors; aluminium compounds; crystal resonators; ion beam assisted deposition; ion beam effects; multilayers; piezoelectric thin films; piezoelectricity; semiconductor thin films; thin film devices; wide band gap semiconductors; AlN; IBAD; aluminum nitride film thickness; high-order mode resonance; high-power handling capability; ion beam assisted deposition; ion beam irradiation; multilayered resonator; piezoelectric properties; polarization inverted multilayered pure shear mode; shear mode resonator; voltage 3 kV; Acoustics; Crystals; Films; Ion beams; Radiation effects; Resonant frequency; Substrates; AlN; Polarizationinverted multi-layer films; c-axis parallel films; pure shear mode;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Ultrasonics Symposium (IUS), 2011 IEEE International
Conference_Location :
Orlando, FL
ISSN :
1948-5719
Print_ISBN :
978-1-4577-1253-1
Type :
conf
DOI :
10.1109/ULTSYM.2011.0075
Filename :
6293063
Link To Document :
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