• DocumentCode
    3223572
  • Title

    Capital productivity-challenge and opportunity

  • Author

    Rowe, William

  • Author_Institution
    IBM Corp., Essex Junction, VT, USA
  • fYear
    1995
  • fDate
    13-15 Nov 1995
  • Firstpage
    23
  • Abstract
    Summary form only given. Controlling the rapidly increasing costs of semiconductor wafer fabricators presents a serious challenge to the semiconductor industry. SEMATECH, in cooperation with its members and SEMI/SEMATECH suppliers has developed a methodology to maintain the historic price per function decline rate for semiconductor products. A series of 0.25 micron generation fab cost models were developed at SEMATECH. The models incorporated advanced logic and DRAM processes, operational and financial inputs and equipment cost and performance goals. Wafer processing costs from the model were compared to affordable costs developed by the SEMATECH Competitive Analysis Group. The result of this process has been a set of mutually agreed upon cost and performance targets for the 0.25 micron generation of equipment. Equipment meeting those targets will be more cost effective than that currently available. High operating efficiency as measured by overall equipment effectiveness (OEE) is essential to achieving improved capital productivity goals.
  • Keywords
    costing; economics; human resource management; semiconductor device manufacture; 0.25 micron; DRAM processes; SEMATECH Competitive Analysis Group; capital productivity; cost models; logic processes; overall equipment effectiveness; semiconductor industry; semiconductor wafer fabricators; Costs; Electronics industry; Logic; Meetings; Microelectronics; Productivity; Random access memory; Semiconductor device manufacture; Semiconductor device modeling;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Advanced Semiconductor Manufacturing Conference and Workshop, 1995. ASMC 95 Proceedings. IEEE/SEMI 1995
  • ISSN
    1078-8743
  • Print_ISBN
    0-7803-2713-6
  • Type

    conf

  • DOI
    10.1109/ASMC.1995.484332
  • Filename
    484332