Economic impact of a new interferometer providing improved overlay for advanced microlithography

Author

Henshaw, Philip D. ; Lis, Steven A.

Author_Institution

SPARTA Inc., Lexington, MA, USA

fYear

1995

fDate

13-15 Nov 1995

Firstpage

81

Lastpage

88

Abstract

The goal of this paper is to examine the economic impact of improved overlay during the lithography process. The motivation for this work is the development at SPARTA of an interferometer able to compensate directly for air turbulence. This improved interferometer will allow better stage positioning, lens and reticle characterization, and alignment of wafers during exposure. In this paper, we examine the effects of improved overlay on integrated circuit (IC) yield and the resulting increase in value to the IC manufacturer for present and future IC generations.

Keywords

economics; integrated circuit manufacture; integrated circuit yield; light interferometers; photolithography; IC manufacturing; SPARTA; air turbulence compensation; economics; integrated circuit yield; interferometer; lens characterization; microlithography; overlay; reticle characterization; stage positioning; wafer alignment; Economic forecasting; Integrated circuit modeling; Integrated circuit yield; Interferometric lithography; Length measurement; Optical interferometry; Optical losses; Optical refraction; Optical variables control; Wavelength measurement;

fLanguage

English

Publisher

ieee

Conference_Titel

Advanced Semiconductor Manufacturing Conference and Workshop, 1995. ASMC 95 Proceedings. IEEE/SEMI 1995

ISSN

1078-8743

Print_ISBN

0-7803-2713-6

Type

conf

DOI

10.1109/ASMC.1995.484345

Filename

484345